Plasma modelling engineer within DE

Introduction to the job

In the position of Plasma Modelling Engineer at ASML, you are responsible for modelling plasma in Extreme Ultraviolet (EUV) Scanners. ASML owns a 3D hybrid Particle-In-Cell (PIC-fluid) model, dedicated developed for EUV-induced plasma. In this role you are responsible for maintaining and further developing this code as well as applying modelled results for developing solutions in scanner. This covers processes in the scanner volume and on the surfaces related to plasma, electrostatics, etching, particle charging and other related processes. You will also further develop and sustain this knowledge with the Competence team and provide input to Hardware and Competence projects in the area of plasma effects on particle release and transport, material degradation and EUV optics. Furthermore, you are responsible for identifying gaps in modelling roadmap and securing work to close these gaps via literature review, setting up academic collaborations or formulation of experimental verification of hypothesis.
 

Role and responsibilities

Education and experience

Academic background, MSc or PhD in physics, chemistry, applied mathematics.
Knowledge of plasma modelling methods, electrostatics, plasma technology and/or surface chemistry. Proximity to PIC models is highly preferred. Hands on knowledge with C, C++, and/or Python.

Experience: 3-7 years
 

Skills

Working at the cutting edge of tech, you’ll always have new challenges and new problems to solve – and working together is the only way do that. You won’t work in a silo. Instead, you’ll be part of a creative, dynamic work environment where you’ll collaborate with supportive colleagues. There is always space for creative and unique points of view. You’ll have the flexibility and trust to choose how best to tackle tasks and solve problems.
To thrive in this job, you’ll need to have: strong communication skills, creativity, proactiveness, a drive for solutions.
 

Other information

The holder of the position reports to the group leader Scanner Plasma in the Defectivity & OLT Performance department and is operational within multidisciplinary research and development projects.
The group of Scanner Plasma Technology provides solutions for defectivity and optics lifetime in the scanner related to plasma processes for the existing as well as new EUV lithography systems and fulfilling the long term roadmap of ASML with new breakthroughs and developments

This position requires access to controlled technology, as defined in the Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.

Diversity and inclusion

ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that diversity and inclusion is a driving force in the success of our company.

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